In this application example, we present a simple MEMS design executed with SolidWorks. We
then analyze some of the performance and reliability considerations for the modeled structure
acting as an electrostatically deflected mirror array, using COSMOS/Works to estimate deflection
vs. voltage and the resulting stresses. We suggest approaches to deal with the physics of very
small structures as appropriate to modeling MEMS devices with finite element analysis (FEA).
Finally, we demonstrate the generation of a two-dimensional mask layout from a threedimensional
solid model. The mask layout may be used to produce a photomask for contact
printing or projection in a mask aligner. The sample MEMS design comprises an array of nickel
mirror elements created with bulk micromachining. The nickel mirror elements are patterned on
a silicon base in a fashion suggested by Parameswaran, et al.1
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